| 84861010.00 |
Machines and apparatus for the treatment of monocrystalline sillicon by a process involving a change of temperature (used for the manufacture of boules or wafers) |
set/kilogram |
30% |
|
|
-- |
| 84861020.00 |
Grinding machines for the manufacture of boules or wafers |
set/kilogram |
30% |
|
|
Compare-84861010.00 |
| 84861030.00 |
Sawing machines for the manufacture of boules or wafers |
set/kilogram |
30% |
|
|
Compare-84861020.00 |
| 84861040.00 |
Chemical mechanical polishers(CMP) for the manufacture of boules or wafers |
set/kilogram |
30% |
|
|
Compare-84861030.00 |
| 84861090.00 |
Other machines and apparatus for the manufacture of boules or wafers |
set/kilogram |
30% |
|
|
Compare-84861040.00 |
| 84862010.00 |
Oxidation, diffusion, annealing and other heat treatment equipment for the manufacture of semiconductor devices or of electronic integrated circuis |
set/kilogram |
30% |
|
|
Compare-84861090.00 |
| 84862021.00 |
Chemical Vapour Deposition(CVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis |
set/kilogram |
30% |
|
|
Compare-84862010.00 |
| 84862022.00 |
Physical Vapour Deposition(PVD)equipment for the manufacture of semiconductor devices or of electronic integrated circuis |
set/kilogram |
30% |
|
|
Compare-84862021.00 |
| 84862029.00 |
Other film deposition equipment for the manufacture of semiconductor devices or of electronic integrated circuis |
set/kilogram |
30% |
|
|
Compare-84862022.00 |
| 84862031.10 |
Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (for post-processing) |
set/kilogram |
100% |
|
|
Compare-84862029.00 |
| 84862031.20 |
Distributed Repeat Lithography Machine for Manufacturing Semiconductor Devices or Integrated Circuits (I-line Lithography Machine for Front Processing) |
set/kilogram |
100% |
|
|
Compare-84862031.10 |
| 84862031.30 |
Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (KrF lithography machine for front-end) |
set/kilogram |
100% |
|
|
Compare-84862031.20 |
| 84862031.90 |
Distributed repetitive lithography machines for manufacturing other semiconductor devices or integrated circuits |
set/kilogram |
100% |
|
|
Compare-84862031.30 |
| 84862039.10 |
I-line lithography machine for manufacturing semiconductor devices or integrated circuits (excluding stepper type) |
set/kilogram |
100% |
|
|
Compare-84862031.90 |
| 84862039.20 |
Krypton fluoride (KrF) lithography machines used for manufacturing semiconductor devices or integrated circuits (excluding stepper) |
set/kilogram |
100% |
|
|
Compare-84862039.10 |
| 84862039.30 |
Argon fluoride (ArF) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper) |
set/kilogram |
100% |
|
|
Compare-84862039.20 |
| 84862039.40 |
ArFi immersion lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper lithography) |
set/kilogram |
100% |
|
|
Compare-84862039.30 |
| 84862039.50 |
Extreme Ultraviolet (EUV) lithography machines for manufacturing semiconductor devices or integrated circuits (excluding stepper) |
set/kilogram |
100% |
|
|
Compare-84862039.40 |
| 84862039.90 |
Lithography equipment for manufacturing semiconductor devices or integrated circuits not listed |
set/kilogram |
100% |
|
|
Compare-84862039.50 |
| 84862041.00 |
Dry plasma etching for the manufacture of semiconductor devices or of electronic integrated circuis |
set/kilogram |
30% |
|
|
Compare-84862039.90 |
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