| 32081000.20 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32082010.30 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32082020.20 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32089090.21 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
L/M |
| 32089090.22 |
Polyimide precursor solution and polyimide resin solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, viscosity (25°C) 2500-3000mPa·s |
kilogram/- |
50% |
A |
L/M |
| 32091000.20 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32099010.20 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32099020.20 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32099090.21 |
Antireflection film-forming solution used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, reflectance (N) 1-2.1, and absorption index (K) (248nm or 193nm wavelength test) 0-1 |
kilogram/- |
50% |
A |
M |
| 32099090.22 |
Spin-coating glass used in integrated circuit production meeting the following criteria: volatile organic content > 700g/L, density 0.8-0.9g/cm3 |
kilogram/- |
50% |
A |
M |
| 72269990.01 |
Flat-rolled products of Fe-Ni alloy steel(of a width of less than 600mm, used for manufacturing the frame for electronic integrated circuits) |
kilogram/- |
20% |
|
|
| 84135020.50 |
High-precision photoresist pump for integrated circuit manufacturing |
set/kilogram |
40% |
|
|
| 84159010.00 |
Other Multi element integrated circuit of the machines of subheadings ,of a refrigerating effect not exceeding 4000Cal per hour , No.8415.1010,8415.1021, 8415.8110 and 8415.8210 |
kilogram/- |
130% |
|
|
| 84159090.00 |
Other Multi element integrated circuit of the machines of subheadings ,of a refrigerating effect exceeding 4000Cal per hour , No.84151022、84152000、84158120、84158220 |
kilogram/- |
90% |
|
|
| 84509010.00 |
Other Multi element integrated circuit for the machines of a dry linen capacity not exceeding 10kg |
kilogram/- |
130% |
|
|
| 84818039.30 |
Gas flow valves for semiconductor devices, integrated circuit, or flat panel display manufacturing equipment (flow control range: 2%-100% of full scale) |
set/kilogram |
30% |
|
|
| 84862031.10 |
Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (for post-processing) |
set/kilogram |
100% |
|
|
| 84862031.20 |
Distributed Repeat Lithography Machine for Manufacturing Semiconductor Devices or Integrated Circuits (I-line Lithography Machine for Front Processing) |
set/kilogram |
100% |
|
|
| 84862031.30 |
Distributed repetitive lithography machine for manufacturing semiconductor devices or integrated circuits (KrF lithography machine for front-end) |
set/kilogram |
100% |
|
|
| 84862031.90 |
Distributed repetitive lithography machines for manufacturing other semiconductor devices or integrated circuits |
set/kilogram |
100% |
|
|
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